Shiu-Wan Hung, An-Pang Wang "A small world in the patent citation network" 2008 IEEE International conference on Industrial Engineering and Engineering Management p.1-5, 2008

Eugene Garfield garfield at CODEX.CIS.UPENN.EDU
Mon Oct 19 16:43:10 EDT 2009


TITLE : A small world in the patent citation network 
   
Author(s): Shiu-Wan Hung; An-Pang Wang  

Source: 2008 IEEE International Conference on Industrial Engineering and 
Engineering Management Pages: 1-5  Published: 2008   

Conference Information: 2008 IEEE International Conference on Industrial 
Engineering and Engineering Management
Singapore, Singapore, 8-11 December 2008  

Abstract: The goal of this report is to characterize the small world 
phenomenon in the patent citations network by analyzing the data of TFT-
LCDs patents. The empirical results suggest that the patent citation 
network can indeed be characterized as "small world". Additionally, the 
patent citation network resembles the power-law connectivity distribution 
and exhibits preferential connectivity behavior. Furthermore, as a patent 
with high betweenness centrality is removed from the citation network, 
50.6% of the patent knowledge communication will be limited. The result of 
this analysis will provide a specific way for managers to map their own 
patent networks and derive insight into the best ways to navigate within 
such networks.  

Accession Number: 10443232  

Document Type: Conference Paper  

Language: English  
Treatment: Practical  
Controlled Indexing: citation analysis; patents  
Uncontrolled Indexing: patent citation network; TFT-LCDs patents; 
preferential connectivity behavior; patent knowledge communication  
Classification Codes: C7240 Information analysis and indexing; C0230B Legal 
aspects of computing  

Author Address: Shiu-Wan Hung; An-Pang Wang; Dept. of Bus. Adm., Nat. 
Central Univ., Tao-Yuan, Taiwan  

Publisher: IEEE, Piscataway, NJ, USA  

Number of References: 29  
U.S. Copyright Clearance Center Code: 978-1-4244-2630-0/08/$25.00  
Standard Book Number: 978-1-4244-2629-4  
DOI: 10.1109/IEEM.2008.4737821  



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